Product Description
Part No.: AMAT 0010-02342 Brand: Applied Materials (AMAT) Description: HEATER ASSY, 200MM POLY ETCH ESC, 8” DXZ Ceramic Heater Assy This is a core electrostatic chuck pedestal assembly for Centura DPS II etch chamber. Constructed with AlN aluminum nitride ceramic, integrated with heating circuit, electrostatic electrode, temperature sensing component and insulation structure. It is designed for electrostatic clamping and precise temperature control of 200mm wafer inside vacuum chamber. It features excellent plasma corrosion resistance and superior thermal uniformity. It is a critical high-value spare part for poly etch process. Available options: new OEM, rebuilt / refurbished, tested used, with test report upon shipment.
Specifications
- Wafer Size: 200mm (8 inch)
- Base Material: AlN Aluminum Nitride Ceramic
- Process Type: DXZ / Poly Etch
- Compatible Platform: AMAT Centura, DPS II Etcher
- Construction: Integrated ESC chuck & heater pedestal, embedded heater element, thermocouple, RF electrode
- Working Condition: Plasma etch vacuum chamber
- Cross Reference: 0010-02467
Application
- Used on AMAT Centura DPS II etcher poly etch process chamber;
- Electrostatically clamps 200mm silicon wafer during etch process, delivers uniform and stable backside temperature control;
- Withstands plasma bombardment to guarantee etch rate, within-wafer uniformity and CD critical dimension stability;
- Widely used for chamber PM, spare part replacement and equipment maintenance in semiconductor fabs.
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