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AMAT 0100-09172 Semiconductor Equipment RF Matching Controller Board

Brand/Manufacturer:AMAT 

Order Number:0100-09172

Country of Origin: USA

Condition: Original Brand

Lead Time: Available in stock

Payment Term: 100% TT In Advance

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Product Description

AMAT 0100-09172 is an RF Match Controller PCB for Applied Materials semiconductor equipment. It is mainly used for etch and thin-film deposition process chambers on Centura platform. This printed circuit board performs closed-loop control for RF matching network. It senses forward and reflected RF power signals, drives the motor inside the matcher to adjust variable capacitors and automatically complete RF impedance matching. It achieves conjugate impedance matching between RF generator and process chamber to reduce reflected RF power loss and stabilize wafer process performance. Equipped with signal acquisition circuits, motor driver and communication interface, it supports fault diagnosis and status feedback. It is a core RF control component for semiconductor dry processing.

Specifications

  • Model: 0100-09172
  • Product Type: RF Match Controller PCB
  • Brand: AMAT (Applied Materials)
  • Compatible Equipment: Centura semiconductor process chambers (Etch / CVD, etc.)
  • Function: Automatic RF impedance matching control, forward/reflected RF power sensing, matching motor driving
  • Communication: On-board internal bus, communicates with RF generator and equipment host
  • Power Supply: On-board ±15V DC / 5V DC
  • Mounting: PCB card installed inside RF match enclosure
  • Environment: Semiconductor equipment cabinet, cleanroom environment
  • Certifications: OEM semiconductor spare part, compliant with SEMI standards
  • Operating Ambient Temperature: 10℃~40℃
  • Relative Humidity: 20%~80%, non-condensing

Application

This PCB is mounted inside the RF matching unit of AMAT Centura tools, applied in dry etching and CVD (Chemical Vapor Deposition) for semiconductor wafer fabrication. It dynamically tunes the RF matching network to minimize reflected RF power and stably deliver RF energy to plasma inside process chamber. The controller continuously monitors matching status and triggers equipment alarms upon matching failure. It ensures consistency of etch rate and film thickness uniformity, serving as a critical spare part for semiconductor front-end processing equipment.

Similar Series Models

0100-09173, 0100-09174, 0100-09175, 0100-09176, 0100-09177




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