Part Number: 0190-07429 Description: Gas Injection Nozzle Assembly for Semiconductor Process Chamber Insert Nozzle Model: ABM405-1-NOZ Manufacturer: Applied Materials (AMAT) Compatible Tool: Centura HDP-CVD Chamber Function: Deliver process gas uniformly onto wafer surface for thin film deposition. Plasma consumable, required periodic PM replacement. Material: High purity Alumina Ceramic (Al₂O₃) Features: Plasma resistant, low outgassing, low particle, precision orifice gas distribution Inspection: Check ceramic cracks, chipping, orifice clogging, surface contamination and porosity
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