AMAT Applied Materials 0190-19549 REV06 High Voltage Direct Current Power Supply Module
I. Basic Material Information
Original part number: 0190-19549
Version: REV 06 (The sixth hardware revision, backward compatible with previous versions such as REV 01/02/03/04/05)
Brand: Applied Materials (a manufacturer of semiconductor wafer processing equipment and its original accessories)
Equipment compatibility: Mainly compatible with AMAT P5000, Centura, and Endura series of semiconductor process equipment for film deposition, etching, and ion implantation
Product type: Industrial closed high-voltage direct current switching power supply, dedicated power supply unit for equipment processing chambers
Core Electrical Parameters
Input specification: Three-phase AC input 200VAC ±10% 50/60Hz, standard industrial power supply for semiconductor equipment
Multiple isolated DC outputs
Main high-voltage output: Multiple stabilized DC high voltages, providing power for RF matchers, ion sources, and chamber bias circuits
Auxiliary low-voltage output: ±15V, +24V, +5V, providing power for boards, sensors, solenoids, and communication circuits
Protection mechanism: Built-in overvoltage OVP, overcurrent OCP, short circuit, overheat OTP, and hardware protection against surges, fault self-locking shutdown and reporting equipment system alarms
Communication interface: Built-in RS485 serial communication, capable of real-time interaction with the equipment main control unit on power operation status, fault codes, output voltage and current parameters

Structure and Environmental Parameters
Installation method: Rack-mounted plug-in installation of the equipment cabinet, equipped with locking and fixing handles, supporting rapid disassembly and assembly for maintenance
Protective structure: Full-metal sealed dust-proof enclosure, with forced air cooling fans and dust filter screens
Operating temperature: 0℃ ~ +50℃; Storage temperature: -20℃ ~ +70℃
Safety certification: UL, CE semiconductor industrial equipment safety certification, electromagnetic compatibility against radio frequency interference, compatible with strong radio frequency conditions for etching, PVD/CVD
Core Functions
Provide multiple stable high-voltage DC power supplies for semiconductor processing chambers, ensuring the stability of ion bombardment and bias control processes during wafer etching and film deposition
Real-time collection of output voltage, current, internal temperature, fan speed and other operating data and upload to the equipment upper computer
In case of failure, quickly cut off all outputs to avoid damage to the chamber, wafer, and RF components at high voltage, and simultaneously trigger the equipment safety interlock shutdown
Support remote start/stop, remote setting of voltage and current parameters, and can be configured in conjunction with process recipes through the equipment software
Typical Application Scenarios
AMAT Centura, Endura, P5000 series PVD physical gas-phase deposition, CVD chemical gas-phase deposition equipment
Dry etching machines, ion implantation machines, plasma cleaning semiconductor wafer processing equipment
TFT panel, photovoltaic coating vacuum process equipment original factory power supply spare parts







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